etch rate uniformity
常見例句
- It is proved that the uniformity of etch rate can be improved and the effect of micro load can be decreased by adjusting the value of chamber pressure, gas flow rate and RF power properly.
結(jié)果表明，通過對反應室壓力、刻蝕氣體流量和射頻功率的調(diào)節(jié)，可以降低微負載效應的影響，得到良好的刻蝕均勻性。 返回 etch rate uniformity