photoetching

基本解釋

The photo-induced etching effect, or development-free vapor photolithography is a very interesting phenomenon.
光致誘蝕作用或無顯影氣相光刻作用是一個(gè)非常有趣的現(xiàn)象。
With the development of Printed Circuit Board (PCB), liquid photo imageable etching resist ink has become the prime process technology of the fine line graph facture.
隨著印制電路板（PCB）行業(yè)的飛速發(fā)展，液態(tài)光致抗蝕油墨已逐漸成為精細(xì)導(dǎo)線圖形制作的主要方法。
The paper introduces a kind of etched sign in most common use. It explains the property and compositions of the photo resist used in etching process.
詳細(xì)介紹了標(biāo)牌中最常用的一種── 蝕刻標(biāo)牌，論述了制作蝕刻標(biāo)牌的感光掩膜材料的特性及組成。