proximity effect correction

基本解釋

Many different schemes have been devised to minimize the proximity effect, such as pattern size correction and dose modulation.
有多種方法對鄰近效應進行修正如劑量調(diào)整、圖形調(diào)整等。
By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.
將付里葉變換法運用于電子束曝光的鄰近效應校正中，形成了快速、準確的劑量校正法。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
此外，用此方法提取的電子散射參數(shù)被成功地用于相同實驗條件下的電子束臨近效應校正。